PERI

Air Toxics at School 2018

School Info

School: General Johnnie Wilson Middle School
Street: 2700 Washington Ave
City: Lorain
State: OH
Number of students: 449
Student % minority: 83%
Type: Regular school
Status: Currently operational
Level: Middle
Data Source: CCD (public schools)

Air Toxics Info

Number of facilities affecting school: 298
Number of chemicals affecting school: 220
Toxic percentile nationwide (1=worst): 5th
Toxic rank nationwide (1=worst): 3,887
Toxic percentile statewide (1=worst): 8th
Toxic rank statewide (1=worst): 277
Toxic Hazard: 21,483.14

There are 4,763 schools with worse air toxic ranks than this school nationwide.
This school's air toxic concentration is 4.65 times the national average at schools.
There are 351 schools with worse air toxic ranks than this school statewide.
This school's air toxic concentration is 1.86 times the state average at schools.

Top 5 facilities

Facility
Parent Company
Toxic Hazard
BASF CORPBASF20,115.45
MPC PLATING INCMPC PLATING INC515.89
BASF TODA AMERICA LLCBASF329.71
MCGEAN-ROHCO INCMCGEAN-ROHCO INC128.53
AVIVA METALS INCAVIVA METALS INC49.96
(click here to expand list to all facilities)

Top chemicals

Chemical
Toxic Hazard
Chromium compounds20,805.14
Cobalt compounds338.82
Chromium117.40
Nickel100.24
Nickel compounds37.13
Cadmium compounds26.60
Cobalt9.60
Formaldehyde8.36
Trichloroethylene5.32
Manganese3.49
Sulfuric acid3.34
Copper compounds3.30
Lead3.14
Diisocyanates2.77
Polycyclic aromatic compounds2.45
Manganese compounds2.09
Copper1.77
Urethane (Ethyl carbamate)1.72
Chlorine1.71
Acrylonitrile1.50
Naphthalene1.23
Lead compounds0.64
Glycol ethers0.54
Molybdenum trioxide0.51
Hydrochloric acid0.46
Hydrogen sulfide0.45
Nitric acid0.41
Barium compounds0.38
Benzene0.37
Hexachlorobenzene0.32
Heptachlor0.22
Hydrogen fluoride0.18
Ethylbenzene0.15
Aluminum (fume or dust)0.14
Acrylic acid0.12
Chloroform0.11
Butyl acrylate0.11
1,2,4-Trimethylbenzene0.10
Aldrin0.09
Zinc0.08
Acrylamide0.08
Zinc compounds0.07
Toxaphene0.05
Ammonia0.05
Chlordane0.04
Antimony0.04
Xylene (mixed isomers)0.03
Toluene-2,4-diisocyanate0.03
Toluenediisocyanate0.03
Tetrachloroethylene (Perchloroethylene)0.02
Carbon tetrachloride0.02
2,4-Dinitrotoluene0.02
Alachlor0.02
1,2-Dichloroethane0.01
Benzo(g,h,i)perylene0.01
Mercury compounds0.01
Epichlorohydrin0.01
Dioxin and dioxin-like compounds0.01
Ethyl acrylate0.01
Dichloromethane0.01
Nitrobenzene0.01
Lindane0.01
Chlorothalonil0.01
n-Butyl alcohol0.01
Triethylamine0.00
Malononitrile0.00
Allyl chloride0.00
n-Hexane0.00
Hydroquinone0.00
Allyl alcohol0.00
Toluene-2,6-diisocyanate0.00
tert-Butyl alcohol0.00
Cyanide compounds0.00
4,4'-Diaminodiphenylether0.00
Styrene0.00
Vinyl chloride0.00
Maleic anhydride0.00
Methyl methacrylate0.00
Pyridine0.00
N,N-Dimethylformamide0.00
Toluene0.00
Parathion0.00
Ethylene glycol0.00
1,1,2-Trichloroethane0.00
Phenol0.00
Methyl isobutyl ketone0.00
Vanadium compounds0.00
Peroxyacetic acid0.00
Aniline0.00
Vinyl acetate0.00
1,4-Dichlorobenzene0.00
Cumene hydroperoxide0.00
Acetonitrile0.00
Warfarin and salts0.00
Methanol0.00
Diazinon0.00
Diethanolamine0.00
Nitrate compounds0.00
Mercury0.00
Atrazine0.00
Selenium compounds0.00
Metribuzin0.00
Phthalic anhydride0.00
2,4-D ((2,4-dichlorophenoxy)acetic acid)0.00
Carbaryl0.00
Methyl acrylate0.00
Bifenthrin0.00
Acetophenone0.00
4,4'-Isopropylidenediphenol0.00
Silver compounds0.00
Methoxychlor0.00
Cumene0.00
Propachlor0.00
Propylene oxide0.00
Chlorobenzene0.00
Formic acid0.00
m-Cresol0.00
1,3-Phenylenediamine0.00
Dichlorobenzene (mixed isomers)0.00
1,2-Dichlorobenzene0.00
Cresol (mixed isomers)0.00
Dibutyl phthalate0.00
Pentachlorobenzene0.00
Sodium nitrite0.00
Cyclohexane0.00
Vinylidene chloride (1,1-dichloroethylene)0.00
1,1,1-Trichloroethane0.00
Malathion0.00
Carbon disulfide0.00
Diphenylamine0.00
Pendimethalin0.00
Dicamba0.00
Ethyl dipropylthiocarbamate0.00
3-Iodo-2-propynyl butylcarbamate0.00
p-Cresol0.00
Quintozene0.00
Carbofuran0.00
Quinone0.00
Chlorobenzilate0.00
Chloroethane (Ethyl chloride)0.00
Creosote, coal tar0.00
o-Cresol0.00
Chloromethane0.00
Thiram0.00
Thiourea0.00
Chlorophenols0.00
1,1,2,2-Tetrachloroethane0.00
Acetaldehyde0.00
1,1,1,2-Tetrachloroethane0.00
Biphenyl0.00
Benzal chloride0.00
Benomyl0.00
Antimony compounds0.00
Anthracene0.00
Tetrabromobisphenol-A (TBBPA)0.00
Amitrole0.00
Nitromethane0.00
Acetamide0.00
Nonylphenol0.00
1-Bromopropane0.00
Benzoyl peroxide0.00
Benzoyl chloride0.00
Benzyl chloride0.00
2,4,6-Trichlorophenol0.00
2,4,5-Trichlorophenol0.00
Triclopyr triethylammonium salt0.00
Butyraldehyde0.00
Trifluralin0.00
sec-Butyl alcohol0.00
2,4-D butoxyethyl ester0.00
Bromoxynil octanoate0.00
Bromomethane (Methyl bromide)0.00
Bis(2-chloroethyl)ether0.00
Captan0.00
Hexachlorophene0.00
Dimethylcarbamyl chloride0.00
N,N-Dimethylaniline0.00
Metham sodium0.00
2,4-Dichlorophenol0.00
Methoxone (MCPA)0.00
Dimethylamine dicamba0.00
Dimethylamine0.00
Methyl chlorocarbonate0.00
Dimethyl sulfate0.00
2-Mercaptobenzothiazole0.00
2,4-Dimethylphenol0.00
Dioxane0.00
Hexachloro-1,3-butadiene0.00
2,4-D 2-ethylhexyl ester0.00
Ethylenebisdithiocarbamic acid, salts and esters0.00
Isosafrole0.00
Lactofen0.00
Ethylene thiourea0.00
Ethylene0.00
Lithium carbonate0.00
2-Ethoxyethanol0.00
Dimethyl phthalate0.00
3,3'-Dimethoxybenzidine0.00
Phenanthrene0.00
Diallate0.00
p-Phenylenediamine0.00
Cyclohexanol0.00
Phosgene0.00
Hexachloroethane0.00
Picloram0.00
Potassium N-methyldithiocarbamate0.00
Crotonaldehyde0.00
Dibenzofuran0.00
Pentachlorophenol0.00
Pentachloroethane0.00
Dichlorvos0.00
1,3-Dichloropropylene0.00
N-methyl-2-pyrrolidone0.00
1,2-Dichloropropane0.00
1,2-Dichloroethylene0.00
Nicotine and salts0.00
4-Nitrophenol0.00
2-Nitropropane0.00
1,2-Dibromoethane0.00
Quinoline0.00
(click here to shrink list to only top 5 chemicals)

Top 5 chemicals from facilities

Facility
Parent Company
Chemical
Toxic Hazard
BASF CORPBASFChromium compounds20,101.61
MPC PLATING INCMPC PLATING INCChromium compounds492.55
BASF TODA AMERICA LLCBASFCobalt compounds307.60
MCGEAN-ROHCO INCMCGEAN-ROHCO INCChromium compounds128.51
AVIVA METALS INCAVIVA METALS INCNickel46.40
(click here to expand list to all chemicals from facilities)